Dry etching device RIE-10NR (parallel plate type RIE device)
A versatile dry etching device boasting hundreds of successful installations.
● High selection ratio and high-precision etching are possible. ● Automatic operation and process parameter storage are possible with PLC control. ● Samples up to φ8 inches can be accommodated. ● High-speed exhaust etching is possible. ● Compact design.
- Company：サムコ
- Price：Other
